Low temperature silicon dioxide by thermal atomic layer...

Journal of Applied Physics 2010 Vol. 107; Iss. 6

Low temperature silicon dioxide by thermal atomic layer deposition: Investigation of material properties

Hiller, D., Zierold, R., Bachmann, J., Alexe, M., Yang, Y., Gerlach, J. W., Stesmans, A., Jivanescu, M., Müller, U., Vogt, J., Hilmer, H., Löper, P., Künle, M., Munnik, F., Nielsch, K., Zacharia
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
107
Year:
2010
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3327430
File:
PDF, 1.02 MB
english, 2010
Conversion to is in progress
Conversion to is failed