High-Quality Low-Temperature Silicon Oxide by...

IEEE Electron Device Letters 2010 / 08 Vol. 31; Iss. 8

High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal–Organic Silicon Precursor and Oxygen Radical

Seok-Jun Won,, Sungin Suh,, Myung Soo Huh,, Hyeong Joon Kim,
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Volume:
31
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/LED.2010.2049978
Date:
August, 2010
File:
PDF, 132 KB
english, 2010
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