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Atomic Layer Deposition of Ruthenium Using the Novel Precursor bis(2,6,6-trimethyl-cyclohexadienyl)ruthenium
Gregorczyk, Keith, Henn-Lecordier, Laurent, Gatineau, Julien, Dussarrat, Christian, Rubloff, GaryVolume:
23
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm2004825
Date:
May, 2011
File:
PDF, 3.10 MB
english, 2011