Degradation mechanism of the AlInAs/GaInAs high electron mobility transistor due to fluorine incorporation
Hayafuji, N., Yamamoto, Y., Ishida, T., Sato, K.Volume:
69
Year:
1996
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.117823
File:
PDF, 347 KB
english, 1996