Ion- and electron-assisted gas-surface chemistry—An...

Journal of Applied Physics 1979 Vol. 50; Iss. 5

Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching

Coburn, J. W., Winters, Harold F.
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Volume:
50
Year:
1979
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.326355
File:
PDF, 877 KB
english, 1979
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