A new model for the diffusion of arsenic in polycrystalline...

Journal of Applied Physics 1988 Vol. 64; Iss. 1

A new model for the diffusion of arsenic in polycrystalline silicon

O’Neill, A. G., Hill, C., King, J., Please, C.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
64
Year:
1988
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.341450
File:
PDF, 1022 KB
english, 1988
Conversion to is in progress
Conversion to is failed