Role of Interstitial Voids in Oxides on Formation and Stabilization of Reactive Radicals: Interstitial HO 2 Radicals in F 2 -Laser-Irradiated Amorphous SiO 2
Kajihara, Koichi, Hirano, Masahiro, Skuja, Linards, Hosono, HideoVolume:
128
Language:
english
Journal:
Journal of the American Chemical Society
DOI:
10.1021/ja0571390
Date:
April, 2006
File:
PDF, 78 KB
english, 2006