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Effect of an ultrathin SiO2 interfacial layer on the hysteretic current–voltage characteristics of CeOx-based metal–insulator–metal structures
Miranda, E., Kano, S., Dou, C., Suñé, J., Kakushima, K., Iwai, H.Volume:
533
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2012.10.105
Date:
April, 2013
File:
PDF, 1.75 MB
english, 2013