Chloride atomic-layer chemical vapor deposition of TiO...

Journal de Physique IV (Proceedings) /Le Journal de Physique IV 2001 / 12 Vol. 11; Iss. PR11

Chloride atomic-layer chemical vapor deposition of TiO 2 with a chloride pretreatment of substrates

Niilisk, A., Rosental, A., Uustare, T., Kasikov, A., Tarre, A.
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Volume:
11
Language:
english
Journal:
Le Journal de Physique IV
DOI:
10.1051/jp4:20011116
Date:
December, 2001
File:
PDF, 265 KB
english, 2001
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