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SPIE Proceedings [SPIE 22nd European Mask and Lithography Conference - Dresden, Germany (Monday 23 January 2006)] 22nd European Mask and Lithography Conference - Analysis method to determine and characterize the mask mean-to-target and uniformity specification
Lee, Sung-Woo, Leunissen, Leonardus H. A., Van de Kerkhove, Jeroen, Philipsen, Vicky, Jonckheere, Rik, Lee, Suk-Joo, Woo, Sang-Gyun, Cho, Han-Ku, Moon, Joo-Tae, Behringer, Uwe F. W.Volume:
6281
Year:
2006
Language:
english
DOI:
10.1117/12.692804
File:
PDF, 417 KB
english, 2006