Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy
Papp, C., Conti, G., Balke, B., Ueda, S., Yamashita, Y., Yoshikawa, H., Uritsky, Y. S., Kobayashi, K., Fadley, C. S.Volume:
112
Year:
2012
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4765720
File:
PDF, 3.38 MB
english, 2012