Plasma-enhanced chemical vapor deposition and...

Journal of Applied Physics 2002 Vol. 92; Iss. 2

Plasma-enhanced chemical vapor deposition and characterization of high-permittivity hafnium and zirconium silicate films

Kato, Hiromitsu, Nango, Tomohiro, Miyagawa, Takeshi, Katagiri, Takahiro, Seol, Kwang Soo, Ohki, Yoshimichi
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Volume:
92
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1487911
File:
PDF, 494 KB
english, 2002
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