Post-lithography pattern modification and its application...

Nanotechnology 2013 / 03 Vol. 24; Iss. 11

Post-lithography pattern modification and its application to a tunable wire grid polarizer

Stach, Michal, Chang, En-Chiang, Yang, Chung-Yuan, Lo, Cheng-Yao
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Volume:
24
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/24/11/115306
Date:
March, 2013
File:
PDF, 1.24 MB
english, 2013
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