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Growth of SiO 2 and TiO 2 thin films deposited by reactive magnetron sputtering and PECVD by the incorporation of non-directional deposition fluxes
Alvarez, R., Romero-Gomez, P., Gil-Rostra, J., Cotrino, J., Yubero, F., Gonzalez-Elipe, A. R., Palmero, A.Volume:
210
Language:
english
Journal:
physica status solidi (a)
DOI:
10.1002/pssa.201228656
Date:
April, 2013
File:
PDF, 496 KB
english, 2013