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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Hopkins versus Abbe': a lithography simulation matching study
Schlief, Ralph E., Liebchen, Armin, Chen, J. Fung, Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474491
File:
PDF, 469 KB
english, 2002