SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Amplification of the index of refraction of aqueous immersion fluids by ionic surfactants
Lee, Kwangjoo, Kunjappu, Joy, Jockusch, Steffen, Turro, Nicholas J., Widerschpan, Tatjana, Zhou, Jianming, Smith, Bruce W., Zimmerman, Paul, Conley, Will, Sturtevant, John L.Volume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.606105
File:
PDF, 169 KB
english, 2005