Mechanism of the Activation of 1,1,3,3-Tetramethyl-1,3-disilacyclobutane in Plasma Chemical Vapor Deposition
Wrobel, A. M., Stanczyk, W.Volume:
6
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm00046a032
Date:
October, 1994
File:
PDF, 582 KB
english, 1994