A Review of SiC Reactive Ion Etching in Fluorinated Plasmas
P. H. Yih, V. Saxena, A. J. StecklVolume:
202
Year:
1997
Language:
english
Pages:
38
DOI:
10.1002/1521-3951(199707)202:13.0.co;2-y
File:
PDF, 756 KB
english, 1997