The Stoichiometric Displacement Model and Langmuir and...

Journal of Chemical Education 2002 / 03 Vol. 79; Iss. 3

The Stoichiometric Displacement Model and Langmuir and Freundlich Adsorption

Geng, Xindu, Zebolsky, Don M.
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Volume:
79
Language:
english
Journal:
Journal of Chemical Education
DOI:
10.1021/ed079p385
Date:
March, 2002
File:
PDF, 107 KB
english, 2002
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