The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditions
Borah, Dipu, Rasappa, Sozaraj, Senthamaraikannan, Ramsankar, Shaw, Matthew T., Holmes, Justin D., Morris, Michael A.Volume:
393
Language:
english
Journal:
Journal of Colloid and Interface Science
DOI:
10.1016/j.jcis.2012.10.070
Date:
March, 2013
File:
PDF, 3.26 MB
english, 2013