Surface and interfacial reaction study of half cycle atomic layer deposited HfO2 on chemically treated GaSb surfaces
Zhernokletov, D. M., Dong, H., Brennan, B., Yakimov, M., Tokranov, V., Oktyabrsky, S., Kim, J., Wallace, R. M.Volume:
102
Year:
2013
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.4800441
File:
PDF, 1.09 MB
english, 2013