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The influence of rf power and oxygen flow rate during deposition on the optical transmittance of copper oxide thin films prepared by reactive magnetron sputtering
Ogwu, A A, Bouquerel, E, Ademosu, O, Moh, S, Crossan, E, Placido, FVolume:
38
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/38/2/011
Date:
January, 2005
File:
PDF, 187 KB
english, 2005