The influence of rf power and oxygen flow rate during...

The influence of rf power and oxygen flow rate during deposition on the optical transmittance of copper oxide thin films prepared by reactive magnetron sputtering

Ogwu, A A, Bouquerel, E, Ademosu, O, Moh, S, Crossan, E, Placido, F
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Volume:
38
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/38/2/011
Date:
January, 2005
File:
PDF, 187 KB
english, 2005
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