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Taguchi method–ANN integration for predictive model of intrinsic stress in hydrogenated amorphous silicon film deposited by plasma enhanced chemical vapour deposition
Asafa, T.B., Tabet, N., Said, S.A.M.Volume:
106
Language:
english
Journal:
Neurocomputing
DOI:
10.1016/j.neucom.2012.10.019
Date:
April, 2013
File:
PDF, 431 KB
english, 2013