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Characterization of the Plasma during the Growth of CNx Films by RF Magnetron Sputtering
N. Alba de Sánchez, C. Rincón, G. Zambrano, P. PrietoVolume:
220
Year:
2000
Language:
english
Pages:
5
DOI:
10.1002/1521-3951(200007)220:13.0.co;2-q
File:
PDF, 97 KB
english, 2000