Strength analysis of EUV-exposed photo resists by AFM at...

Microelectronic Engineering 2012 / 10 Vol. 98

Strength analysis of EUV-exposed photo resists by AFM at 40nm half pitch and below

Winroth, Gustaf, Gronheid, Roel, Kim, Tae-Gon, Mertens, Paul W.
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Volume:
98
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2012.07.056
Date:
October, 2012
File:
PDF, 546 KB
english, 2012
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