Dielectric relaxation in hafnium oxide: A study of...

Journal of Applied Physics 2011 Vol. 110; Iss. 10

Dielectric relaxation in hafnium oxide: A study of transient currents and admittance spectroscopy in HfO2 metal-insulator-metal devices

Mannequin, C., Gonon, P., Vallée, C., Bsiesy, A., Grampeix, H., Jousseaume, V.
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Volume:
110
Year:
2011
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3662913
File:
PDF, 1.13 MB
english, 2011
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