Low temperature atomic layer deposition of noble metals...

Thin Solid Films 2013 / 03 Vol. 531

Low temperature atomic layer deposition of noble metals using ozone and molecular hydrogen as reactants

Hämäläinen, Jani, Puukilainen, Esa, Sajavaara, Timo, Ritala, Mikko, Leskelä, Markku
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Volume:
531
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2013.01.091
Date:
March, 2013
File:
PDF, 1.29 MB
english, 2013
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