In Situ Reaction Mechanism Studies on Atomic Layer...

Chemistry of Materials 2012 / 10 Vol. 24; Iss. 20

In Situ Reaction Mechanism Studies on Atomic Layer Deposition of Al x Si y O z from Trimethylaluminium, Hexakis(ethylamino)disilane, and Water

Tomczak, Yoann, Knapas, Kjell, Haukka, Suvi, Kemell, Marianna, Heikkilä, Mikko, Ceccato, Marcel, Leskelä, Markku, Ritala, Mikko
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
24
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm301658m
Date:
October, 2012
File:
PDF, 1.90 MB
english, 2012
Conversion to is in progress
Conversion to is failed