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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Approaching the numerical aperture of water immersion lithography at 193-nm
Smith, Bruce W., Bourov, Anatoly, Fan, Yongfa, Zavyalova, Lena V., Lafferty, Neal V., Cropanese, Frank C., Smith, Bruce W.Volume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.537262
File:
PDF, 1.11 MB
english, 2004