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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Fundamental solutions for real-time optical CD metrology
Opsal, Jon L., Chu, Hanyou, Wen, Youxian, Chang, Yia-Chung, Li, Guangwei, Herr, Daniel J. C.Volume:
4689
Year:
2002
Language:
english
DOI:
10.1117/12.473448
File:
PDF, 401 KB
english, 2002