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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Performance of a 1.35NA ArF immersion lithography system for 40-nm applications
de Klerk, Jos, Wagner, Christian, Droste, Richard, Levasier, Leon, Jorritsma, Louis, van Setten, Eelco, Kattouw, Hans, Jacobs, Jowan, Heil, Tilmann, Flagello, Donis G.Volume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.712094
File:
PDF, 2.63 MB
english, 2007