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SPIE Proceedings [SPIE Photonics Fabrication Europe - Brugge, Belgium (Monday 28 October 2002)] MEMS/MOEMS: Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly - Lithographic performance of an ASML i-line step-and-repeat system by using photosensitive Durimides
Pellens, Rudy J. M., van Klaveren, Angelique, Voets, Rutger, van den Heuvel, Jean-Paul, Misat, Sylvain, Waterson, Pamela J., Peterson, Laurie J., Behringer, Uwe F. W., Courtois, Bernard, Khounsary, AlVolume:
4945
Year:
2003
Language:
english
DOI:
10.1117/12.471974
File:
PDF, 710 KB
english, 2003