SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Optical/Laser Microlithography - Design and analysis of a high-NA projection optical system for 0.35-μm deep-UV lithography
Hill, Andrew V., Webb, James E., Phillips, Anthony R., Connors, James E., Cuthbert, John D.Volume:
1927
Year:
1993
Language:
english
DOI:
10.1117/12.150456
File:
PDF, 791 KB
english, 1993