Oxidation Rate Effect on the Direction of Metal-Assisted...

The Journal of Physical Chemistry C 2010 / 06 Vol. 114; Iss. 24

Oxidation Rate Effect on the Direction of Metal-Assisted Chemical and Electrochemical Etching of Silicon

Huang, Zhipeng, Shimizu, Tomohiro, Senz, Stephan, Zhang, Zhang, Geyer, Nadine, Gösele, Ulrich
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Volume:
114
Language:
english
Journal:
The Journal of Physical Chemistry C
DOI:
10.1021/jp911121q
Date:
June, 2010
File:
PDF, 2.69 MB
english, 2010
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