![](/img/cover-not-exists.png)
Bias temperature instability analysis on memory properties improved by hydrogen annealing treatment in Ti/HfO x /Pt capacitors
Kim, Hee-Dong, Yun, Min Ju, Hong, Seok Man, An, Ho-Myoung, Kim, Tae GeunVolume:
7
Language:
english
Journal:
physica status solidi (RRL) - Rapid Research Letters
DOI:
10.1002/pssr.201307192
Date:
July, 2013
File:
PDF, 427 KB
english, 2013