Bias temperature instability analysis on memory properties...

Bias temperature instability analysis on memory properties improved by hydrogen annealing treatment in Ti/HfO x /Pt capacitors

Kim, Hee-Dong, Yun, Min Ju, Hong, Seok Man, An, Ho-Myoung, Kim, Tae Geun
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Volume:
7
Language:
english
Journal:
physica status solidi (RRL) - Rapid Research Letters
DOI:
10.1002/pssr.201307192
Date:
July, 2013
File:
PDF, 427 KB
english, 2013
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