Current conduction mechanisms in atomic-layer-deposited HfO[sub 2]/nitridedâSiO[sub 2] stacked gate on 4H silicon carbide
Cheong, Kuan Yew, Moon, Jeong Hyun, Kim, Hyeong Joon, Bahng, Wook, Kim, Nam-KyunVolume:
103
Year:
2008
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2908870
File:
PDF, 1.31 MB
english, 2008