Run-to-Run Critical Dimension and Sidewall Angle...

IEEE Transactions on Semiconductor Manufacturing 2004 / 08 Vol. 17; Iss. 3

Run-to-Run Critical Dimension and Sidewall Angle Lithography Control Using the PROLITH Simulator

Chemali, C.E., Freudenberg, J., Hankinson, M., Bendik, J.J.
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Volume:
17
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/TSM.2004.831530
Date:
August, 2004
File:
PDF, 774 KB
english, 2004
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