Modelling of inductively coupled plasma processing reactors

Journal of Physics D Applied Physics 2001 / 09 Vol. 34; Iss. 18

Modelling of inductively coupled plasma processing reactors

Bose, Deepak, Hash, David, Govindan, T R, Meyyappan, M
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Volume:
34
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/34/18/305
Date:
September, 2001
File:
PDF, 403 KB
english, 2001
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