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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Alternative Lithographic Technologies II - Advances in roll-to-roll imprint lithography for display applications

Jeans, Albert, Almanza-Workman, Marcia, Cobene, Robert, Elder, Richard, Garcia, Robert, Gomez-Pancorbo, Fernando, Jackson, Warren, Jam, Mehrban, Kim, Han-Jun, Kwon, Ohseung, Luo, Hao, Maltabes, John,
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Volume:
7637
Year:
2010
Language:
english
DOI:
10.1117/12.852268
File:
PDF, 22.48 MB
english, 2010
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