Oligomerization and Polymerization Steps in Remote Plasma...

Chemistry of Materials 2001 / 05 Vol. 13; Iss. 5

Oligomerization and Polymerization Steps in Remote Plasma Chemical Vapor Deposition of Silicon−Carbon and Silica Films from Organosilicon Sources

Wróbel, A. M., Walkiewicz-Pietrzykowska, A., Hatanaka, Y., Wickramanayaka, S., Nakanishi, Y.
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Volume:
13
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm001044+
Date:
May, 2001
File:
PDF, 190 KB
english, 2001
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