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Oligomerization and Polymerization Steps in Remote Plasma Chemical Vapor Deposition of Silicon−Carbon and Silica Films from Organosilicon Sources
Wróbel, A. M., Walkiewicz-Pietrzykowska, A., Hatanaka, Y., Wickramanayaka, S., Nakanishi, Y.Volume:
13
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm001044+
Date:
May, 2001
File:
PDF, 190 KB
english, 2001