Micropatterning of poly(dimethylsiloxane) using a photoresist lift-off technique for selective electrical insulation of microelectrode arrays
Park, Jaewon, Kim, Hyun Soo, Han, ArumVolume:
19
Language:
english
Journal:
Journal of Micromechanics and Microengineering
DOI:
10.1088/0960-1317/19/6/065016
Date:
June, 2009
File:
PDF, 828 KB
english, 2009