Growth mechanism of polycrystalline silicon films from hydrogen-diluted SiCl[sub 4] at low temperature
Lin, Xuanying, Lin, Kuixun, Huang, Chuajun, Yu, Yunpeng, Luo, Yilin, Yu, Chuying, Huang, RuiVolume:
98
Year:
2005
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1996828
File:
PDF, 542 KB
english, 2005