Coalescence aspects of III-nitride epitaxy

Coalescence aspects of III-nitride epitaxy

Lebedev, V., Tonisch, K., Niebelschütz, F., Cimalla, V., Cengher, D., Cimalla, I., Mauder, Ch., Hauguth, S., Ambacher, O., Morales, F. M., Lozano, J. G., González, D.
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Volume:
101
Year:
2007
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2464195
File:
PDF, 1.73 MB
english, 2007
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