Behavior of charged particles in an electron cyclotron...

Applied Physics Letters 1990 Vol. 57; Iss. 22

Behavior of charged particles in an electron cyclotron resonance plasma chemical vapor deposition reactor

Nakayama, Yoshikazu, Kondoh, Mitsuru, Hitsuishi, Kohji, Zhang, Mei, Kawamura, Takao
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Volume:
57
Year:
1990
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.103892
File:
PDF, 534 KB
english, 1990
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