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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Integrated mask and optics simulations for mask corner rounding effect in OPC modeling
Xue, Jing, Deng, Zhijie, Koo, Kyoil, Shiely, James, Lee, Sooryong, Zhang, Yunqiang, Fan, Yongfa, Schmoeller, Thomas, Montgomery, M. Warren, Maurer, WilhelmVolume:
7823
Year:
2010
Language:
english
DOI:
10.1117/12.866197
File:
PDF, 5.18 MB
english, 2010