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Mechanism of Boron Diffusion in Silicon: An Ab Initio and Kinetic Monte Carlo Study
Sadigh, Babak, Lenosky, Thomas J., Theiss, Silva K., Caturla, Maria-Jose, Diaz de la Rubia, Tomas, Foad, Majeed A.Volume:
83
Language:
english
Journal:
Physical Review Letters
DOI:
10.1103/PhysRevLett.83.4341
Date:
November, 1999
File:
PDF, 64 KB
english, 1999