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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Impact of optical absorption on process control for sub-0.15-nm device patterning using 193-nm lithography
Okoroanyanwu, Uzodinma, Levinson, Harry J., Romero, Jeremias, Singh, Bhanwar, Lee, Shih-Jung, Sullivan, Neal T.Volume:
3998
Year:
2000
Language:
english
DOI:
10.1117/12.386537
File:
PDF, 1.26 MB
english, 2000