![](/img/cover-not-exists.png)
Dependence of the fused-silica etch rate on the etch mask opening diameter
Kimmle, Christina, Wolff, Sandra, Doering, Christoph, Fouckhardt, HenningVolume:
112
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.05.006
Date:
December, 2013
File:
PDF, 827 KB
english, 2013