Dependence of the fused-silica etch rate on the etch mask...

Dependence of the fused-silica etch rate on the etch mask opening diameter

Kimmle, Christina, Wolff, Sandra, Doering, Christoph, Fouckhardt, Henning
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Volume:
112
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2013.05.006
Date:
December, 2013
File:
PDF, 827 KB
english, 2013
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