SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Advancements in organic antireflective coatings for dual-damascene processes
Deshpande, Shreeram V., Shao, Xie, Lamb III, James E., Brakensiek, Nickolas L., Johnson, Joe, Wu, Xiaoming, Xu, Gu, Simmons, William J., Sullivan, Neal T.Volume:
3998
Year:
2000
Language:
english
DOI:
10.1117/12.386539
File:
PDF, 2.93 MB
english, 2000