![](/img/cover-not-exists.png)
Focussed ion beam induced damage in silicon studied by scanning capacitance microscopy
Brezna, W, Wanzenb ck, H, Lugstein, A, Bertagnolli, E, Gornik, E, Smoliner, JVolume:
18
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/18/4/301
Date:
April, 2003
File:
PDF, 165 KB
english, 2003